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BS ISO 14606:2022:2023 Edition

BS ISO 14606:2022:2023 Edition

$142.49

Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials

Published By Publication Date Number of Pages
BSI 2023 26
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PDF Catalog

PDF Pages PDF Title
2 National foreword
6 Foreword
7 Introduction
9 1 Scope
2 Normative references
3 Terms and definitions
4 Symbols and abbreviated terms
10 5 Setting parameters for sputter depth profiling
5.1 General
5.2 Auger electron spectroscopy
11 5.3 X-ray photoelectron spectroscopy
5.4 Secondary ion mass spectrometry
12 6 Depth resolution at an ideally sharp interface in sputter depth profiles
6.1 Measurement of depth resolution
6.2 Average sputtering rate ļæ¼
6.3 Depth resolution āˆ†z
13 7 Procedures for optimization of parameter settings
7.1 Alignment of sputtered area with a smaller analysis area
7.1.1 General
14 7.1.2 AES
15 7.1.3 XPS with a small probe (e.g. monochromator)
7.1.4 XPS with a large area source (e.g. without monochromator)
7.1.5 SIMS
7.2 Optimization of parameter settings
17 Annex A (informative) Factors influencing the depth resolution
20 Annex B (informative) Typical single-layered systems as reference materials
21 Annex C (informative) Typical multilayered systems used as reference materials
22 Annex D (informative) Uses of multilayered systems
23 Bibliography

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BS ISO 14606:2022
$142.49